Automation and information-measuring equipment

Modeling of nanofilms formation dynamics

Authors

O. I. Derevyanko
National Metallurgical Academy of Ukraine ROR
O. Ye. Kviatkovskyi
Дніпропетровський національний університет

Keywords

nanomaterials cvd-approach molecular dynamic gas phase diffusion

Abstract

Modeling of nanomaterials deposition process using CVD-technology applying non-linear molecular dynamic methods is performed; dependence of Fourier amplitude-frequency characteristic on initial value of atom motion velocity (temperature) and factor of gas phase diffusion is obtained.
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How to Cite

[1]
“Modeling of nanofilms formation dynamics”, Вісник ВПІ, no. 3, pp. 13–16, Nov. 2010, Accessed: Oct. 03, 2026. Available: https://visnyk.vntu.edu.ua/index.php/visnyk/article/view/741

Author Biographies

O. I. Derevyanko, National Metallurgical Academy of Ukraine
доцент кафедри інформаційних технологій і систем
O. Ye. Kviatkovskyi, Дніпропетровський національний університет
студент

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