Radioelectronics and radioelectronic equipment manufacturing
Multichannel recording system of the emission spectrum of nonequilibrium plasma
Keywords
plasma-chemical etching
optical radiation
photoconverters
the registration system
the electrical circuit
microcontroller
Abstract
On the basis of the microcontroller RІS16F877A microprocessor system of registration of the emission spectrum of nonequilibrium plasma is designed to control plasma-chemical processes. The system allows simultaneous processing of data from four independent sources of information and visualize the target process of plasma etching of microstructures.
How to Cite
[1]
“Multichannel recording system of the emission spectrum of nonequilibrium plasma”, Вісник ВПІ, no. 4, pp. 169–172, Nov. 2010, Accessed: Oct. 05, 2026. Available: https://visnyk.vntu.edu.ua/index.php/visnyk/article/view/1502
