Radioelectronics and radioelectronic equipment manufacturing
The problem of increasing the efficiency of monitoring and control of plasma chemical process
Keywords
plasma-chemical processes
microelectronic technology
control
sensor
plasma-chemical etching
controller
Abstract
The given paper analyses the ways aimed at improvement of control efficiency of plasma chemical processes in microelectronic technologies due to introduction of new approaches in realization of monitoring base on modern achievements in this field, as well as construction of control systems in real-time, development of modern controllers on the base of usage of process model applying modern sensors in feedback circuit , development of the new types of controller.
How to Cite
[1]
“The problem of increasing the efficiency of monitoring and control of plasma chemical process”, Вісник ВПІ, no. 6, pp. 119–125, Nov. 2010, Accessed: Oct. 05, 2026. Available: https://visnyk.vntu.edu.ua/index.php/visnyk/article/view/545
