The problem of increasing the efficiency of monitoring and control of plasma chemical process
Keywords:
plasma-chemical processes, microelectronic technology, control, sensor, plasma-chemical etching, controllerAbstract
The given paper analyses the ways aimed at improvement of control efficiency of plasma chemical processes in microelectronic technologies due to introduction of new approaches in realization of monitoring base on modern achievements in this field, as well as construction of control systems in real-time, development of modern controllers on the base of usage of process model applying modern sensors in feedback circuit , development of the new types of controller.Downloads
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Abstract views: 164
Published
2010-11-12
How to Cite
[1]
Y. S. Kravchenko, V. S. Osadchuk, and S. Y. Kravchenko, “The problem of increasing the efficiency of monitoring and control of plasma chemical process”, Вісник ВПІ, no. 6, pp. 119–125, Nov. 2010.
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Section
Radioelectronics and radioelectronic equipment manufacturing
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